Samsung Electronics will apply next-generation lithography equipment, "High NA extreme ultraviolet (EUV)," to advanced DRAM production in 2028. This is the first time Samsung Electronics will apply High NA EUV to mass production of DRAM.
Samsung Electronics said on the 8th it will expand cooperation with Dutch semiconductor equipment maker ASML to introduce High NA EUV for advanced DRAM manufacturing by 2028.
High NA EUV is next-generation lithography technology that increases the numerical aperture (NA) over existing EUV equipment to implement finer circuits. While the NA of conventional EUV is 0.33, High NA EUV is 0.55. As resolution improves, it can reduce some processes that require multiple exposures with existing EUV, which is advantageous for miniaturization and process simplification.
Samsung Electronics plans to apply High NA EUV to advanced DRAM mass-production products to verify process conditions, Production yield, and productivity. Through this, it aims to secure the process technology needed for DRAM miniaturization and move up the timeline for mass-production application of High NA EUV.
Samsung Electronics was the first in the memory industry to apply the EUV process to DRAM production in 2020. In March this year, it brought in High NA EUV equipment to Korea for the first time.
Samsung Electronics will also join the "large mask consortium" led by ASML to develop 12-inch photomasks. Currently, 6-inch photomasks are mainly used in semiconductor lithography processes. A photomask is a master used to transfer semiconductor circuit patterns onto a wafer, and enlarging its size can increase the area processed at once to improve productivity.
Samsung Electronics plans to participate in developing technologies and verifying manufacturing methods related to 12-inch photomasks, based on its mass-production experience in memory and foundry.
Jun Young-hyun, vice chairman and CEO of Samsung Electronics, said, "The advent of the AI era is changing the semiconductor industry paradigm and further elevating the importance of technological innovation across the value chain," and added, "We will further strengthen cooperation with ASML to build a technological foundation for 'Next AI.'"
Christophe Fouquet, CEO of ASML, said, "Samsung Electronics has long been one of ASML's key innovation partners," and added, "As we enter a new era led by AI, we look forward to driving innovation for next-generation semiconductor manufacturing together with Samsung Electronics."