Samsung Electronics has succeeded in developing a new gas to replace trifluoromethane (CHF₃), which is used in semiconductor etching processes. The aim is to speed up the achievement of its "carbon neutrality" goal through an alternative gas that is suitable for process use while producing fewer greenhouse gas emissions than trifluoromethane.
According to the industry on the 23rd, Samsung Electronics' Device Solutions (DS) division recently unveiled "G2," developed in collaboration with Japanese gas producer Daikin. The two companies attended the semiconductor equipment exhibition "SEMICON Japan 2025," held in Tokyo from Dec. 17 to 19, and introduced semiconductor processes applying the alternative gas G2.
Trifluoromethane is used in the "etching" process, which chemically removes unnecessary parts from the surface of a semiconductor wafer to create the desired circuit pattern. It is an essential material in semiconductor manufacturing, but the problem is that it produces a high volume of greenhouse gas emissions. According to the Intergovernmental Panel on Climate Change (IPCC) Sixth Assessment Report (AR6), the global warming potential (GWP) of trifluoromethane is 11,700. This means its impact on global warming is 11,700 times higher than carbon dioxide (CO₂). G2 has a GWP roughly 90% lower than trifluoromethane. Samsung Electronics plans to begin full-scale application of G2 in its processes starting next year.
In addition to G2, Samsung Electronics' DS division has been developing substitutes for high–greenhouse gas emitting etching gases. G1, an alternative to octafluorocyclobutane (C₄F₈) with a GWP of 10,200, has been introduced into processes since 2018. G3, an alternative to carbon tetrafluoride (CF₄) with a GWP of 7,380, has been applied to processes starting this year. G3 has a 100% lower GWP than carbon tetrafluoride.
To develop these alternative gases, Samsung Electronics conducted evaluations and analyses of various candidate substances with its partners. The company introduced selected alternatives into its processes after going through phases including ▲ materials supplier evaluation ▲ equipment supplier evaluation ▲ Samsung Electronics research lab introduction evaluation ▲ mass-production line evaluation.
Samsung Electronics' DS division moved to develop alternative gases for semiconductor etching to reduce "Scope 1" emissions and strengthen environmental, social and governance (ESG) management. Scope 1 refers to greenhouse gas emissions from assets owned, controlled or operated by corporations. About 70% of Samsung Electronics' Scope 1 emissions come from process gases.
Samsung Electronics' DS division announced a new environmental management strategy in 2022 and said it would achieve carbon neutrality (net zero greenhouse gas emissions) by 2050. To that end, the company has introduced alternative gases and, as the first in the semiconductor industry, developed RCS, a large-scale integrated treatment facility for process gases. Last year, four additional RCS units were installed on one production line, bringing the total in operation to 52. A Samsung Electronics official said, "We verified that developing and applying third-generation catalysts on-site improved perfluorocarbon (PFCs) treatment efficiency to as high as 97%."
Samsung Electronics also plans to continue reducing indirect greenhouse gas emissions (Scope 2) through various activities with partners. Through its official website tech blog, the company said, "We are not limiting the use of the developed alternative gases to our 'own lines' but are opening them to the semiconductor industry," adding, "This will also help reduce carbon emissions from semiconductor process gases."